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Soft-x-ray projection lithography: printing of 0.2-μm features using a 20:1 reduction

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Abstract

We demonstrate nearly diffraction-limited printing of 0.2-μm features, using soft x rays of approximately 36-nm wavelength. An open-stencil transmission mask with minimum features of 4 μm was imaged by a twentyfold-reduction Schwarzschild-type objective onto silicon wafers coated with various e-beam resists. Implications for soft-x-ray projection lithography are discussed.

© 1990 Optical Society of America

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