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Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination

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Abstract

We report the demonstration of a reflection microscope that operates at 13.2nm wavelength with a spatial resolution of 55±3nm. The microscope uses illumination from a tabletop extreme ultraviolet laser to acquire aerial images of photolithography masks with a 20s exposure time. The modulation transfer function of the optical system was characterized.

© 2009 Optical Society of America

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