Abstract

We propose and validate a new, to the best of our knowledge, approach to designing a polarization-independent waveguide grating coupler, using an optimized polysilicon overlay on a silicon grating structure. Simulations predicted coupling efficiencies of about −3.6 dB and −3.5 dB for TE and TM polarizations, respectively. The devices were fabricated using photolithography in a multi-project wafer fabrication service by a commercial foundry and have measured coupling losses of −3.96 dB for TE polarization and −3.93 dB for TM polarization.

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Optimized shift-pattern overlay for high coupling efficiency waveguide grating couplers

Xuetong Zhou and Hon Ki Tsang
Opt. Lett. 47(15) 3968-3971 (2022)

Combined polysilicon and silicon gratings for dual-wavelength-band waveguide grating couplers

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Polarization-independent fiber-chip grating couplers optimized by the adaptive genetic algorithm

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High coupling efficiency waveguide grating couplers on lithium niobate

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