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Abstract
We proposed a novel, to the best of our knowledge, design for a dual-wavelength-band waveguide grating coupler. The proposed structure works in both the C band and O band. The proposed device is optimized from an initial design of two independent gratings formed on the silicon and polysilicon overlay layers, respectively. We designed the up layer (polysilicon) for the C band and the down layer (silicon) for the O band as the initial optimization seed. After numerical optimization of this structure using a genetic algorithm, the grating coupler has a coupling efficiency of −3.86 dB at the C band and −4.46 dB at the O band. We validate the approach in a commercial foundry using 193-nm photolithography in a multi-project wafer, and the experimental result has coupling efficiencies of −4.37 dB in the C band and −5.8 dB in the O band.
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