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Conferences > CLEOPR > 2022 > P_CM11 > P_CM11_02

Advanced Dry Etching of GaAs/AlGaAs Multilayer Wafer for Circular Defect in Photonic Crystal (CirD) Laser

Hanqiao Ye, Yifan Xiong, Rubing Zuo, Masaya Morita, Kenta Kaichi, Akihiro Maruta, Hirotake Kajii, Masato Morifuji, and Masahiko Kondow

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Abstract

We improved dry etching process by introducing 3-steps etching and 3 layers of quantum dots for fabricating the CirD laser that will be used for intra-chip optical communications. Excellent lasing property was consequently obtained.

© 2022 IEEE

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