Abstract
Femtosecond laser ablation of positive ions from transparent, polished slides of single crystalline Al2O3 is studied by time-of-flight mass spectrometry The incident fluence from an amplified Ti:Sapphire laser could be varied between 0.5 J/cm2 and 2.7 J/cm2, the maximum being well below the single-shot damage threshold for Al2O3 at 3.0 J/cm2. We investigated the emission of positive ions, negative ions, and electrons, usually averaging the signals over several hundred pulses. All experiments were conducted in the previously described 'strong etch' regime [1], i.e. after a preceding incubation the samples show a strong response to the incident radiation. In this regime, the ion emission is characterized by a stable average rate, consisting of stochastically alternating pulses with high and with low yield. Thus, sampling over 500 pulses for each data point leads stable, reliable, and reproducible results.
© 2000 IEEE
PDF ArticleMore Like This
M. Hashida, S. Namba, K. Okamuro, S. Tokita, and S. Sakabe
MJ1_4 Conference on Lasers and Electro-Optics/Pacific Rim (CLEO/PR) 2009
R. Stoian, D. Ashkenasi, A. Rosenfeld, M. Lorenz, and E.E.B. Campbell
CFK4 Conference on Lasers and Electro-Optics (CLEO:S&I) 2000
J. Badziak, J. Makowski, P. Parys, J. Wolowski, E. Woryna, and A.B. Vankov
TuF2 International Conference on Ultrafast Phenomena (UP) 2000