Abstract
We report the experimental results of beryllium based multilayer mirrors for use in the 11.4 nm region. Mirrors using molybdenum as the high-Z material have demonstrated 68.7% peak reflectance at 11.3 nm.
© 1994 Optical Society of America
PDF ArticleMore Like This
Hisataka Takenaka, Tomoaki Kawamura, Yoshikazu Ishii, Tsuneyuki Haga, and Hiroo Kinoshita
EC.26 Extreme Ultraviolet Lithography (EUL) 1994
Tai D. Nguyen, Ronald Gronsky, and Jeffrey B. Kortright
WB.2 Soft X-Ray Projection Lithography (SXRAY) 1993
Claude Montcalm, P. A. Kearneyt, J. M. Slaughtert, M. Chaker, and Charles M. Falco
MA.2 Physics of X-Ray Multilayer Structures (PXRAYMS) 1994