Abstract

With the increase of the information density on optical discs, it becomes increasingly necessary to improve the quality and the resolution of the optical disc mastering process. One possible approach is to reduce the size of recorded structures by a reduction of the λ/NA ratio of the recorder. Indeed, mastering at UV wavelengths has been put into practice by several companies. This paper deals with another possible route towards higher resolution. It is shown that the combination of improved photoresist processes and better exposure techniques can lead to a clear reduction of the smallest achievable pit size. Combining such techniques with UV mastering, pit lengths below 200nm should be well within reach of classical optical disc mastering.

© 1996 Optical Society of America