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Real-time Monitoring of Surface Reactions on Si(111) by Optical Second-Harmonic Generation

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Abstract

The sensitivity of optical second-harmonic generation (SHG) to atomic and molecular monolayers absorbed on surfaces of centrosymmetric media has now been well established.1 Recent work has also demonstrated the dependence of the SHG process on the ordering and symmetry of the surface region.2 In this paper, we apply the surface SHG technique to follow in real time some widely studied and technologically important reactions occurring on clean, well-defined Si(111)-7x7 surfaces. We discuss here both the oxidation of the Si surface and the formation of thin layers of disordered and epitaxial Pd silicide.

© 1985 Optical Society of America

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