Abstract

If a local gas ambient of 10⁻³ to 10⁻² torr pressure of a metal halide, organometallic, or hydrocarbon gas is produced at a surface, deposition of material can be induced where ions are incident. The ion beam is thought to cause the breakup of molecules adsorbed on the surface. Deposition of a mixture of Al, C, and O has been reported⁽¹⁾ from a gas of Al(CH₃)₃ and mixture of W and O from a gas of WF₆. We have used a capillary gas feed of dimethyl gold hexafluoro acetylacetonate (C₇H₇F₆O₂Au) and induced gold deposition using a focused 15kV Ga⁺ ion beam or broad beams of 50kV Si⁺ and 0.75kV Ar⁺. See Fig. 1.

© 1987 Optical Society of America