Abstract

Synchrotron radiation (SR) is a unique light source having several outstanding features. These features include 1) strong intensity in the X-ray to VUV range, 2) good directionality and 3) light source is clean due to the ultra high vacuum. Laser excited CVD and etching processes are also attractive as new semiconductor fabrication techniques, but, many gas molecules used in semiconductor processes show strong absorption in the VUV range, where no laser can emit sufficient intensity of photons. This problem can be solved using SR as the light source in the photo-excited processes. It therefore holds considerable promise in the development of new materials and processing techniques in the future. In this paper, we introduce our recent experiments of SR-excited CVD and etching conducted at Photon Factory in National Laboratory for High Energy Physics, and discuss the feasibility of using SR as a light source in the photo-excited semiconductor processes.

© 1987 Optical Society of America