Comparison Between Classical and Ion Assisted Deposited TiO2 Layers for Optical Coatings

M. Lottiaux; M. Lottiaux; C. Boulesteix; F. Varnier; F. Flory; E. Pelletier

doi:10.1364/OIC.1988.ThB11

Optical Interference Coatings
Technical Digest Series (Optica Publishing Group, 1988),
paper ThB11
•https://doi.org/10.1364/OIC.1988.ThB11

Comparison Between Classical and Ion Assisted Deposited TiO₂ Layers for Optical Coatings

M. Lottiaux, C. Boulesteix, F. Varnier, F. Flory, and E. Pelletier

Optical Interference Coatings 1988

Tucson, Arizona United States
12–15 April 1988
ISBN:

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Deposition Techniques: 1 (ThB)

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M. Lottiaux, C. Boulesteix, F. Varnier, F. Flory, and E. Pelletier, "Comparison Between Classical and Ion Assisted Deposited TiO2 Layers for Optical Coatings," in Optical Interference Coatings, Technical Digest Series (Optica Publishing Group, 1988), paper ThB11.

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Abstract

The Electron Microscopy shows that the observed microstructure of titania films produced by Ion Assisted Deposition strongly differs from that of films produced by classical evaporation.

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