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Intermittent Ion Assisted Deposition of Silica and Titania

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Abstract

The improvement of the optical and mechanical properties of optical thin films towards more bulk like behaviour achieved by ion assisted deposition is well established1-5. In principle it should be possible to mount a ion gun in a conventional evaporation chamber in order to take advantage of the IAD process. But there are some questions to be answered regarding the effective area which can be treated by the ion beam of a commercially available ion gun.

© 1988 Optical Society of America

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