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Ion-Assisted-Deposition using a High-Output End-Hall Ion Source

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Abstract

Over the last ten years considerable effort has gone into the development and use of Ion-Assisted-Deposition (IAD) in the manufacturing of optical thin-film coatings.1-4 During the last 6 years a collaborative effort has finally culminated in producing a “High-Output” Mark II ion source. Compared to the standard 5 Amp Mark II the new source raises the anode current limit from 5 to 15 Amps and the voltage from 170 to 275 Volts. This higher operating limit has opened a huge new parameter space in which to investigate the materials and processes involved in the production of thin-film optical filters.

© 1998 Optical Society of America

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