Thin film measurement on semiconductor surface in GHz-THz frequency range

Ming Li; G.C. Cho; S.-Q. Wang; J.T. Kenndy; T.-M. Lu; X.-C. Zhang

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 1999),
paper CWF61

Thin film measurement on semiconductor surface in GHz-THz frequency range

Ming Li, G.C. Cho, S.-Q. Wang, J.T. Kenndy, T.-M. Lu, and X.-C. Zhang

Conference on Lasers and Electro-Optics 1999

Baltimore, Maryland United States
23–26 May 1999
ISBN: 1-55752-570-6

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M. Li, G. C. Cho, S. -. Wang, J. T. Kenndy, T. -. Lu, and X. -. Zhang, "Thin film measurement on semiconductor surface in GHz-THz frequency range," in Conference on Lasers and Electro-Optics, C. Chang-Hasnain, W. Knox, J. Kafka, and K. Vahala, eds., OSA Technical Digest (Optica Publishing Group, 1999), paper CWF61.

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Abstract

For design of electronic devices performing at high frequency the characterization of dielectric property of interlevel material is a crucial subject.

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