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Conferences > CLEO > 2001 > CME > CME5
  • Conference on Lasers and Electro-Optics
  • OSA Technical Digest (Optica Publishing Group, 2001),
  • paper CME5

A pump-probe investigation of krypton droplet plasma formation in an intense laser field

S. J. McNaught, J. Fan, E. Parra, and H. M. Milchberg

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Abstract

Over the past several years, work has progressed on a laser plasma-based source for extreme ultraviolet (EUV) lithography.1 The interaction of intense laser pulses with noble gas droplets produces EUV radiation with efficiencies (~0.5% in the reflective optics bandwidth) comparable to those of solid targets, but with minimal debris generation.

© 2001 Optical Society of America

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