Advanced Source Studies on Laser Produced Plasmas for EUV Lithography

R. C. Spitzer; D. P. Gaines

doi:10.1364/EUL.1994.SEL.243

Extreme Ultraviolet Lithography
Technical Digest Series (Optica Publishing Group, 1994),
paper SEL.243
•https://doi.org/10.1364/EUL.1994.SEL.243

Advanced Source Studies on Laser Produced Plasmas for EUV Lithography

R. C. Spitzer and D. P. Gaines

Extreme Ultraviolet Lithography 1994

California United States
19–21 September 1994
ISBN:

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Sources for EUV Lithography (SEL)

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R. C. Spitzer and D. P. Gaines, "Advanced Source Studies on Laser Produced Plasmas for EUV Lithography," in Extreme Ultraviolet Lithography, Technical Digest Series (Optica Publishing Group, 1994), paper SEL.243.

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Abstract

Laser-produced plasmas are source candidates for EUV lithography. The radiation angular distribution for several target materials is investigated and source debris is characterized.

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