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Conferences > CLEO > 2008 > CMKK > CMKK5
  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
  • OSA Technical Digest (CD) (Optica Publishing Group, 2008),
  • paper CMKK5

Fabrication of Photonic Crystal Light-emitting Diode with Photoelectrochemical Wet Etching and Phase Mask Interference

Cheng-Yen Chen, Cheng-Hung Lin, Dong-Ming Yeh, Chih-Feng Lu, Chi-Feng Huang, and C. C. Yang

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Abstract

We demonstrate the high light-extraction efficiency by using the photoelectrochemical etching technique for forming photonic crystal structures on an InGaN/GaN quantum-well light-emitting diode through phase-mask interference. More than 90% increase of output power is observed.

© 2008 Optical Society of America

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