Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • The Pacific Rim Conference on Lasers and Electro-Optics
  • Technical Digest Series (Optica Publishing Group, 1995),
  • paper ThH2

Effect of polarization on laser etching in microelectronics material processing

Not Accessible

Your library or personal account may give you access

Abstract

Laser is a versatile source of energy that has been widely used in material processing such as cutting, drilling, welding and etching. It had been applied to most materials including metals, insulators, semiconductors, polymers and magnetic materials. Therefore, it is necessary to understand the surface absorption in the study of thermochemical, photochemical and thermal processing in laser microprocessing. Models of temperature distribution by irradiation of laser beam had been introduced by several groups such as Moody1 and Lax.2 In this study, the polarization dependence of surface absorption is incorporated into the laser-induced temperature model to investigate the polarization effect in laser processing.

© 1995 IEEE

PDF Article
More Like This
Excimer laser etching of microelectronic materials

JAMES H. BRANNON
WX1 Conference on Lasers and Electro-Optics (CLEO:S&I) 1988

Pulsed UV-laser processings for new materials

H. Hiraoka
ThN1 Conference on Lasers and Electro-Optics/Pacific Rim (CLEO/PR) 1995

Laser-enhanced etching of polyimide films for microelectronics

P. A. Moskowitz, D. R. Vigliotti, and Robert J. Von Gutfeld
FA1 Conference on Lasers and Electro-Optics (CLEO:S&I) 1983

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.