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  • The 4th Pacific Rim Conference on Lasers and Electro-Optics
  • Technical Digest Series (Optica Publishing Group, 2001),
  • paper MB2_2

Carbon nitride thin films prepared by KrF pulsed excimer laser deposition in NO ambient gas

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Abstract

Carbon nitride (CNx) thin films were deposited on Si (100) substrate in NO ambient gas using pulsed KrF excimer laser deposition. N/C composition ratio of 1.02 was obtained at a laser fluence of 5 J/cm2 and 200 mTorr NO.

© 2001 IEEE

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