Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Crystalline Carbon Nitride Thin Films Deposition by DC Arc Source Evaporation with Pulsed Laser Ablation

Not Accessible

Your library or personal account may give you access

Abstract

Production of crystalline carbon nitride(CN) thin films with nitrogen content up to 57 % has remained an intriguing problem in the field of material science. Up to date numerous investigations in CN thin films deposition resulted in nanocrystalline specimen with nitrogen content less than 45 %. We reported about crystalline CN thin films deposition by nitrogen DC arc source evaporation combined with pulsed laser ablation(PLA) as a source of gas phase carbon.

© 1998 IEEE

PDF Article
More Like This
Carbon Nitride Films Synthesis and Deposition by Excimer Laser Ablation of Graphite Targets in Nitrogen Atmosphere

S. Acquaviva, E. D’Anna, M.L. De Giorgi, G. Leggieri, A. Luches, M. Martino, A. Perrone, and A. Zocco
CMF3 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 1998

Crystalline carbon nitride films coherently grown on Si (100) substrates by reactive pulsed laser ablation

G Barucca, L Elia, M Fernandez, A Luches, G Majni, M Martino, and P Mengucci
CWF58 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 2000

Laser reactive ablation deposition of thin nitride films

E. D'Arma, G. Leggieri, A. Luches, M. Martino, A. Perrone, G. Majni, P. Mengucci, and B. Luk'yanchuk
CThI32 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 1994

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.