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Industrialization of a Laser Produced Plasma EUV Light Source for Lithography

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ASML is committed to develop high power EUV source technology for use in EUV lithography for high-volume-manufacturing (HVM) of semiconductors. A stable dose controlled Laser-Produced-Plasma (LPP) EUV source has been successfully developed and introduced using a CO2 laser and small tin (Sn) droplets.

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