Abstract
This study presents the results of the optimization of the optical properties of TiN and TiOx thin films by employing Taguchi orthogonal tables approach. The presented results demonstrated the possibility to tune the optical properties of investigated conductive/dielectric films in the UV-Vis range by the appropriate setting of sputtering parameters. The presented findings are the basis for the fabrication of periodic stacks for the application in the technology of metamaterials.
© 2021 The Author(s)
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