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Conferences > CLEO_Europe > 1998 > CThF > CThF4

Cr4+:Y3Al5O12 and Cr4+:Gd3Ga5O12 laser waveguide structures fabricated by pulsed laser deposition

Tetsu Hasegawa, Kyoichi Adachi, Akihiko Machida, Sachiyo Fukaya, Minoru Obara, Hiroshi Kumagai, and Katsumi Midorikawa

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Abstract

Optical waveguide structures have great advantages over bulk crystals, such as optical confinement, compactness and device integration capability. Recently, chromium-doped Y3Al5O12 (Cr4+:YAG), Gd3Ga5O12 (Cr4+:GGG) crystals have attracted much attention as a solid-state waveguide tunable laser at 1.35 μm - 1.45 μm and a saturable absorber around 1.0 μm. Pulsed laser deposition (PLD) technique is quite suitable for fabrication of the Cr4+:YAG, Cr4+:GGG thin films, because we can easily control the valence state of the Cr ion in the Cr4+:YAG, Cr4+:GGG thin films. In this study, we have fabricated high optical quality Cr4+:YAG and Cr4+:GGG thin films.

© 1998 IEEE

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