Micro-Machining of Glass by Excimer Laser Ablation

F. von Alvensleben; C. Graumann; J.W. Wais

doi:10.1364/CLEO_EUROPE.1998.CThH81

Conference on Lasers and Electro-Optics-Europe
Technical Digest Series (Optica Publishing Group, 1998),
paper CThH81
•https://doi.org/10.1364/CLEO_EUROPE.1998.CThH81

Micro-Machining of Glass by Excimer Laser Ablation

F. von Alvensleben, C. Graumann, and J.W. Wais

The European Conference on Lasers and Electro-Optics 1998

Glasgow, Scotland United Kingdom
14–18 September 1998
ISBN:

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Poster Session (CThH)

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F. von Alvensleben, C. Graumann, and J. W. Wais, "Micro-Machining of Glass by Excimer Laser Ablation," in Conference on Lasers and Electro-Optics-Europe, Technical Digest Series (Optica Publishing Group, 1998), paper CThH81.

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Abstract

Micro-structuring of glass has been examined using UV radiation. The etch depth profile has been investigated. The limitations and possibilities for micro-structuring on glass has been found for the wavelengths of 193nm, 248nm and 308nm.

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