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Laser reactive ablation deposition of thin nitride films

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Abstract

Lasers are used in materials processing from the beginning of the laser era, but their potentialities in this field have not yet been fully exploited and new laser- based techniques are emerging. The most recent one is laser reactive ablation (LRA) of thin films.1−4 In the LRA deposition method a solid support collects the material ablated by the laser irradiation of a target and reacted with an ambient gas. LRA has the advantage of being a singlestep process for synthesis and deposition of films.

© 1994 IEEE

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