Debris free sub-µm structuring of arylazophosphonate containing polymers by XeCl excimer laser ablation

F Beinhorn; J. Ihlemann; M.N. Nobis; O. Nuyken

Conference on Lasers and Electro-Optics Europe
Technical Digest Series (Optica Publishing Group, 2000),
paper CTuO8

Debris free sub-µm structuring of arylazophosphonate containing polymers by XeCl excimer laser ablation

F Beinhorn, J. Ihlemann, M.N. Nobis, and O. Nuyken

The European Conference on Lasers and Electro-Optics 2000

Nice France
10–15 September 2000
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Laser Micromachining (CTuO)

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F. Beinhorn, J. Ihlemann, M. N. Nobis, and O. Nuyken, "Debris free sub-µm structuring of arylazophosphonate containing polymers by XeCl excimer laser ablation," in Conference on Lasers and Electro-Optics Europe, Technical Digest Series (Optica Publishing Group, 2000), paper CTuO8.

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Abstract

Poly(arylazophosphonate)s are photolabile polymers with sufficient absorption at 308 nm to be patterned by XeCl laser ablation [1]. Photoinduced fragmentation is accompanied by generation of molecular nitrogen supporting the ablation process. Practically no debris is found on the ablation site or on the surrounding area.

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