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Conferences > CLEO_Europe > 2000 > CWF > CWF56
  • Conference on Lasers and Electro-Optics Europe
  • Technical Digest Series (Optica Publishing Group, 2000),
  • paper CWF56

A new of photo-cleaning technique for semiconductor wafers with vacuum ultraviolet excimer lamps

Atsushi Yokotani, Yoshinari Maezono, Yousuke Motokawa, Kenji Fujimoto, and Kou Kurosawa

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Abstract

A new photo-cleaning technique of organic contamination on silicon wafers utilizing excimer lamps has been developed. A decomposition rate of 20 µg/min·cm2 has been achieved.

© 2000 IEEE

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