Abstract

Nonlinear absorption-based 2-photon lithography (2PL) has become the technology of choice in many fields dealing with micro- and nano-fabrication [1]. While this technology offers unmatched capabilities in terms of resolution, structure complexity, and material selection it is still limited in its throughput due to its point-by-point fabrication nature. Additionally, while positioning speed and accuracy is constantly improving [2], there is a hard limit on the overall possible translation velocity due to the necessity to overlap single pulses during scanning to form continuous lines. For instance, if the maximum laser repetition rate is considered to be 100 MHz, increasing linear translation velocity beyond ~100 m/s becomes nearly impossible. Therefore, to assure continuous development and adoption of the 2PL, the next generation of solutions concerning throughput needs to be developed.

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