Dispersion Engineering of High-Q Si3N4 Microdisk Resonators

Kaiyi Wu; Andrew W. Poon

doi:10.1364/CLEO_SI.2018.SW4B.4

Conference on Lasers and Electro-Optics
OSA Technical Digest (online) (Optica Publishing Group, 2018),
paper SW4B.4
•https://doi.org/10.1364/CLEO_SI.2018.SW4B.4

Dispersion Engineering of High-Q Si₃N₄ Microdisk Resonators

Kaiyi Wu and Andrew W. Poon

CLEO: Science and Innovations 2018

San Jose, California United States
13–18 May 2018
ISBN: 978-1-943580-42-2

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Nitride-based Integrated Photonics (SW4B)

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K. Wu and A. W. Poon, "Dispersion Engineering of High-Q Si3N4 Microdisk Resonators," in Conference on Lasers and Electro-Optics, OSA Technical Digest (online) (Optica Publishing Group, 2018), paper SW4B.4.

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Abstract

We demonstrate Si₃N₄ waveguide-coupled microdisk resonators with a loaded Q-factor of 2.4×10⁶ at 1550 nm. We tailor the cavity dispersion by increasing the Si₃N₄ microdisk thickness and using a thin oxide cladding.

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