Atom Lithography with Chromium

U. Drodofsky; M Drewsen; B. Brezger; G. Schreiber; D. Krogmann; Ch. Weber; J. Stuhler; T. Pfau; J. Mlynek

European Quantum Electronics Conference
Technical Digest Series (Optica Publishing Group, 1996),
paper JThA3

Atom Lithography with Chromium

U. Drodofsky, M Drewsen, B. Brezger, G. Schreiber, D. Krogmann, Ch. Weber, J. Stuhler, T. Pfau, and J. Mlynek

European Quantum Electronics Conference 1996

Hamburg Germany
8–13 September 1996
ISBN:

From the session
Symposium on Nanostructures Microstructures (JThA)

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U. Drodofsky, M. Drewsen, B. Brezger, G. Schreiber, D. Krogmann, C. Weber, J. Stuhler, T. Pfau, and J. Mlynek, "Atom Lithography with Chromium," in European Quantum Electronics Conference, Technical Digest Series (Optica Publishing Group, 1996), paper JThA3.

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Abstract

Using neutral atoms for lithography is a new method of generating nanostructures on a substrate. Atom lithography provides a new technology that enables one to write directly nanometer scale structures onto a substrate in a parallel process.

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