Abstract

The direct deposition of atomic patterns onto a surface provides an interesting way to extend conventional microfabrication methods to the regime below 100 nm structure size. Deposition techniques that have been realized so far rely on the use of conservative forces to imprint a transverse density pattern in an atomic beam and direct the atoms onto the surface. In the technique pioneered by McClelland et al. [1] a standing-wave light field channels the atoms into the bottom of the potential wells formed by the light shift where they hit the surface and slick.

© 1996 IEEE