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Solid-state-laser driven plasma produced from laser-preformed tin microdroplets for high-brightness EUV

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Abstract

Extreme ultraviolet (EUV) nanolithography relies on CO2-lasers to drive EUV-emitting tin plasma at 10.6-micrometer wavelength. We will present research using instead solid-state laser light, at 2-micrometer wavelength, to efficiently drive plasma from carefully preshaped targets.

© 2022 The Author(s)

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More Like This
Solid-State-Laser-Produced Microdroplet-Tin Plasma Sources of Extreme Ultraviolet Radiation

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EF2A.2 Compact EUV & X-ray Light Sources (EUVXRAY) 2020

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