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Conferences > EUVXRAY > 2022 > JW5A > JW5A.8

Generation of 2-Micrometer Wavelength Laser-Light to Drive EUV-Emitting Plasmas

Lars Behnke, Yahia Y. Mostafa, Ruben Schupp, Zoi Bouza, Adam Lassise, Muharrem Bayraktar, John Sheil, Ronnie Hoekstra, Wim Ubachs, and Oscar O. Versolato

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Abstract

A laser system based on three-wave mixing is used to generate laser-light at 2-micometer wavelength. This system is used for in-depth studies of the utility of 2-micrometer-driven sources of extreme ultraviolet (EUV) light in Nanolithography.

© 2022 The Author(s)

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