R&amp;D Activities of EUV Lithography at NewSUBARU, and Possibility of Beyond EUV

Takeo Watanabe; Tetsuo Harada; Shinji Yamakawa

doi:10.1364/EUVXRAY.2022.EW6A.6

Optica High-brightness Sources and Light-driven Interactions Congress 2022
Technical Digest Series (Optica Publishing Group, 2022),
paper EW6A.6
•https://doi.org/10.1364/EUVXRAY.2022.EW6A.6

R&D Activities of EUV Lithography at NewSUBARU, and Possibility of Beyond EUV

Takeo Watanabe, Tetsuo Harada, and Shinji Yamakawa

Compact EUV & X-ray Light Sources 2022

Budapest Hungary
21–25 March 2022
ISBN: 978-1-957171-06-7

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Applications-II Semiconductor and Material Science (EW6A)

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T. Watanabe, T. Harada, and S. Yamakawa, "R&D Activities of EUV Lithography at NewSUBARU, and Possibility of Beyond EUV," in Optica High-brightness Sources and Light-driven Interactions Congress 2022, Technical Digest Series (Optica Publishing Group, 2022), paper EW6A.6.

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Abstract

The R&D of basic technologies such as mask, resist, optical element, optics. have been carried out at NewSUBARU synchrotron light facility since 1996. EUV Lithography started use in production from 2019 for 7 nm node logic devices and from 2020 for 5 nm node logic devices. Current status and prospect of EUV and usage probability of BEUV will be reported. And the necessity of BEUV-FEL will be discussed.

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