Comparison of Two Interferometric Methods for Wave Aberration Measurement in Distributed-Index Microlens

John E. Batubara; Kenichi Iga

doi:10.1364/GIOIS.1987.FA5

Topical Meeting on Gradient-Index Optical Imaging Systems
Technical Digest Series (Optica Publishing Group, 1987),
paper FA5
•https://doi.org/10.1364/GIOIS.1987.FA5

Comparison of Two Interferometric Methods for Wave Aberration Measurement in Distributed-Index Microlens

John E. Batubara and Kenichi Iga

Gradient-Index Optical Imaging Systems 1987

Reno, Nevada United States
15–16 January 1987
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J. E. Batubara and K. Iga, "Comparison of Two Interferometric Methods for Wave Aberration Measurement in Distributed-Index Microlens," in Topical Meeting on Gradient-Index Optical Imaging Systems, Technical Digest Series (Optica Publishing Group, 1987), paper FA5.

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Abstract

Since the performance of every optical component is directly influenced by the existence of aberration, the measurement of wave aberration is essential in characterizing such components. Interferometry is one of the effective methods to obtain a clear information on the performance of such lenses.

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