Abstract

An optical channel waveguide array coupled to a charge-coupled device (CCD) linear imaging array and integrated onto the same silicon substrate has been fabricated and successfully operated. The channel waveguide array is formed by preferential-etching of V-grooves in the 100 plane of silicon.¹ The integrated device differs from slab waveguide-CCD structures²,³ in that the present structure is configured such that an individual channel waveguide is coupled to each array element of the CCD image sensor. The channel waveguide structure thus provides a method for parallel injection of signals into a CCD which eliminates crosstalk due to capacitive coupling associated with high frequency electrical signal injection and which provides greater channel isolation and channel density than a comparable bulk optical wave structure.⁴

© 1978 Optical Society of America