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A New Technique for Waveguide Formation in LiNbO3

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Abstract

The fabrication of active optical waveguides is one of the most important subjects for integrated optics. LiNbO3 and LiTaO3 are among the best available waveguide media for this application because of their excellent properties in electro-, acousto-optic interactions. Optical waveguides in LiNbO3 and LiTaO3 have been proposed and demonstrated using various techniques. The first LiNbO3 waveguide was formed by out-diffusion of Li2O so that the extraordinary index of refraction increased at the surface.1 Later, optical waveguides were also formed in LiNbO3 and/or LiTaO3 crystals by in-diffusion of transition metal ions,2 epitaxial growth by melting3 or by sputtering.4 The most promising and widely used method is the diffusion of Ti metal which provides single mode, low-loss (⪝1 dB/cm) waveguides. In addition, the photolithographic technology can be utilized to form sophisticated optical circuits. However, a major problem in waveguide formation by metal in-diffusion is that at high diffusion temperatures, Li2O escaped from the surface through the out-diffusion process. As a result, there is an unwanted planar waveguide in addition to the waveguides formed by metal in-diffusion. This paper reports a new technique of using organo-metallic solutions as diffusion sources to form single mode waveguides in LiNbO3. The preliminary experimental results showed that no Li2O out-diffusion waveguide was formed with this new diffusion process. The technique is expected to work equally well for LiTaO3 crystals.

© 1978 Optical Society of America

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