Sensitivity of AsxSe100-x thin films for electron beam irradiation

Nina Nordman; Olli Nordman; Nasser Peyghambarian

doi:10.1364/IODC.1998.LFC.5

International Optical Design Conference
Technical Digest Series (Optica Publishing Group, 1998),
paper LFC.5
•https://doi.org/10.1364/IODC.1998.LFC.5

Sensitivity of As_xSe_100-x thin films for electron beam irradiation

Nina Nordman, Olli Nordman, and Nasser Peyghambarian

International Optical Design Conference 1998

Kailua-Kona, Hawaii United States
8–12 June 1998
ISBN:

From the session
Gradient Index Optics (LFC)

Not Accessible

Your library or personal account may give you access

Get PDF
Email
Share
Get Citation
Copy Citation Text
N. Nordman, O. Nordman, and N. Peyghambarian, "Sensitivity of AsxSe100-x thin films for electron beam irradiation," in International Optical Design Conference, Technical Digest Series (Optica Publishing Group, 1998), paper LFC.5.

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Citation alert
Save article

Abstract

Recently we have reported on the influence of the electron beam on As₂S₃ thin films [1-3]. However, the sensitivity of the As_xSe_100-x thin films with different compositions has not been investigated [4]. Here we report on our measurement of the index change of As_xSe_100-x thin films for the construction of the graded index optical components.

PDF Article

More Like This

Sofl-X-Ray Generation from 100 Femtosecond Irradiation of Thin Film Targets

Harry W. K. Tom, Obert R. Wood, Gary D. Aumiller, and Mordecai D. Rosen
WE1 International Conference on Ultrafast Phenomena (UP) 1990

Characteristics of SiOxFy Thin Films Prepared by Ion Beam Assisted Deposition

F.J. Lee and C.K. Hwangbo
MA.14 Optical Interference Coatings (OIC) 1998

Self-written waveguides in As2S3 thin films by two-photon absorption

Chiara Meneghini and Alain Villeneuve
QWG6 European Quantum Electronics Conference (EQEC) 1998

Previous Article Next Article