Abstract

Multilayer GaAs-GaAlAs thin film structures are used extensively in optical electronics and are of considerable promise for integrated optics. Although planar technology has long been used in electronic integrated circuit industry, it is only in its initial development stage in monolithic integrated optics. Selective diffusion^(1,2), etching^(3,4) and proton bombardment^(3,5) for fabricating stripe geometry lasers and waveguides have been reported.

© 1976 Optical Society of America