Abstract

Laser-induced chemical vapor deposition (LICVD) has been developed over recent years as a powerful method for preparing thin films and structures on various substrates. This technique competes successfully with existing methods due to the fact that photons often allow a better control of the processes involved. In the meantime the applicability of the LICVD method has been shown for numerous chemical systems including deposition of metals, semiconductors and insulators. However, detailed understanding of the. participating processes still lags behind and often the results reported seriously contradict each other, revealing the complicated nature of the processes involved.

© 1988 Optical Society of America