Raman Analysis of Inorganic Thin Films*

D.R. Tallant; K.L. Higgins; P.J. Hargis; A.F. Stewart

doi:10.1364/LMD.1987.WA3

Topical Meeting on Lasers in Materials Diagnostics
Technical Digest Series (Optica Publishing Group, 1987),
paper WA3
•https://doi.org/10.1364/LMD.1987.WA3

Raman Analysis of Inorganic Thin Films^*

D.R. Tallant, K.L. Higgins, P.J. Hargis, and A.F. Stewart

Lasers in Material Diagnostics 1987

Albuquerque, New Mexico United States
11–12 February 1987
ISBN:

From the session
Optical Diagnostics of Semiconductors and Thin-Films-Raman (WA)

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D. R. Tallant, K. L. Higgins, P. J. Hargis, and A. F. Stewart, "Raman Analysis of Inorganic Thin Films*," in Topical Meeting on Lasers in Materials Diagnostics, Technical Digest Series (Optica Publishing Group, 1987), paper WA3.

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Abstract

Techniques for the Raman analysis of plasma-deposited submicrometer silicon films on metallic substrates and dielectric films on Raman-active substrates will be described and typical results will be presented.

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