Characterization of Photochemical Processing

Masatake Hirose

Microphysics of Surfaces, Beams, and Adsorbates 1985

From the session
Session V (TuB)

Open Access

Abstract

Photochemical etching processes of SiO₂ in NF₃ plus H₂ gas and GaAs in Cl₂ using ArF excimer laser by in-situ x-ray photo-electron spectroscopy.

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