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Activated-Dssociative Adsorption Studied Using Very Low Energy Ion Beams

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Abstract

The energy range from 1 to 100 eV will provide interesting chemical processes associated with a non-adiabatic process and the ion beam can be easily accelerated into the wide energy range. Moreover, the ion-surface interactions including surface reactions in this energy range are essential to elucidate the fundamental process in plasma deposition and others. However, very low energy (≤100 eV) ion beams have been scarcely employed in studying dynamical process on surfaces.

© 1989 Optical Society of America

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