Abstract

The use of holographic optical elements for interconnection of VLSI circuits shows great potential for improving operational speed, reducing power consumption, and facilitating new system architectures. The potential for commercial application of this technology is enhanced through the use of design and fabrication facilities that are currently available to the electronics industry. A CALMA design station, commonly used for CAD of VLSI circuits, has been employed for automated generation of interconnection hologram patterns. The magnetic computer tape resulting from this process is acceptable to commercial electron beam lithography systems, such as MOSIS. Design issues relating to the utilization of the high space–bandwidth product of holograms fabricated with electron beam lithography while controlling the volume of data generated by the design process are addressed. Characteristics of holograms generated with this process are assessed.

© 1986 Optical Society of America