Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Ion-assisted deposition of thermally evaporated Ag films

Open Access Open Access

Abstract

Optical constants of thin Ag films (~50 nm thick) deposited by thermal evaporation on prisms were measured at 632.8 nm by the attenuated total reflection method. The effects of Ar-ion energy and current on the refractive index and extinction coefficient of IAD Ag films are presented. Their electrical resistivity, measured with a four-point probe, is also discussed. Finally, the results of humidity tests are described.

© 1987 Optical Society of America

PDF Article
More Like This
Ion-Assisted Deposition of Thermally Evaporated Ag Films

C.K. Hwangbo, L.J. Lingg, J.P. Lehan, M.R. Jacobson, H.A. Macleod, J.L. Makhous, and S.Y. Kim
ThB9 Optical Interference Coatings (OIC) 1988

Optical properties of ThF4 films deposited using ion-assisted deposition

Ghanim A. Al-Jumaily, L. Yazlovitsky, T. Mooney, and A. Smajkiewicz
THS6 OSA Annual Meeting (FIO) 1987

Ion-assisted deposition of Al2O3 thin films

J. D. Targove, M. J. Messerly, and H. A. Macleod
THPO41 OSA Annual Meeting (FIO) 1987

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.