Abstract
Correlation of film properties and microstructure with ion beam parameters in ion-assisted deposition (IAD) provides insights for improving IAD thin films. It is well-known that the ion beam energy and ion flux are two main parameters which alter the microstructure of thin films and their optical properties. Parmigiani et al.1 related the normalized energy, defined as the energy delivered by the bombarding ions per arriving metal atom, to microstructural changes of Ag films in a dual ion-beam sputtering system.
© 1988 Optical Society of America
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