Abstract

In the past decade, there has been tremendous advances in our ability to generate, control, manipulate, focus and detect x-rays. The past few years have witnessed the developments of normal incidence x-ray mirrors, beamsplitters, diffraction limited lenses, etc. Using these capabilities, workers are taking the first steps towards the development of sophisticated soft x-ray optical systems for microlithography. Details of these developments and the requirements for submicron lithography are discussed.

© 1990 Optical Society of America