Abstract

Synchrotron soft-x-ray sources have been used to ad vance the state of x-ray optics in the last two decades, particularly in the fields of microscopy and microlithography. However, the size and cost of a synchrotron installation is burdensome in many instances. Even so-called compact storage ring sources occupy substantial floor space when the beam lines are laid out and appropriate shielding is installed. Thus, there continues to be significant development of nonsynchrotron sources for microscopy and microlithography applications. In the past decade, development has shifted away from e-beam excited fluorescent sources and toward plasma sources in order to achieve the necessary high radiating efficiency.

© 1990 Optical Society of America