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Previous experiments by AT&T Bell Laboratories [1] have demonstrated the feasibility of using a soft x-ray projection system to produce feature sizes down to 0.05 microns in a tri-level resist. Their experiments used a Schwarzschild objective and 140Å radiation from an undulator at the National Synchrotron Light Source. We describe here a similar imaging system with the exception that it is based upon illumination using a high-fluence laser plasma source (LPS) of soft x-rays instead of a synchrotron radiation source. The use of a laser plasma point source offers significant advantages of size and cost over synchrotron sources but with some tradeoffs. The intent of the experimental program described in this paper is to determine the viability of the LPS for future implementation of soft x-ray projection lithography (SXPL).
© 1991 Optical Society of America
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